Nanoimprint Lithography (Eitre6，Obducat) is a simple nanolithography process of fabricating nanometer scale patterns with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting.
Features:
Imprint Area: ≤ 150 mm Ø
Stamp and Substrate Thickness: ≤ 2mm
Imprint Pressure: 8 – 80 bar
Imprint Temperature: ambient temperature – 300 ℃
UV Light: on or off (250 – 1000 nm, 30 – 40 mW/cm2)
