Atomic Force Microscope（AFM, Dimension ICON）is an analytical instrument used to study the surface structure of solid materials, including insulators. It studies the surface structure and properties of materials by detecting extremely weak atomic interactions between the surface of the test sample and a micro force sensitive element.Main characteristics:Scanning range in the XY direction: ≥90 μmScanning ...

DualBeam Scanning Electron Microscope (Versa 3D，FEI Company) is a commercial imaging machine at micro and nano scale. The Versa 3D is a combination of two systems: 1) A Scanning Electron Microscope (SEM) produces enlarged images of a variety of specimens achieving magnification over 100 000× providing high resolution imaging in a digital format; 2) A Focused Ion Beam (FIB) system is capable of...

The electron beam lithography (EBL) system (eLINE Plus，Raith) supports both ultra-high-resolution electron beam lithography and large-area nanofabrication. Large-area nanofabrication can be several millimeters to centimeters long, while maintaining minimum line edge roughness with stitch-free exposure technologies. It provides a  processing platform for micro-nano fabrication, nanoengineering,...

Inductively coupled plasma etching (ICP, PlasmaPro100 Cobra300, Oxford Instruments) is a deep reactive ion etching technique. The system has two independent radio frequency power supplies, which have the characteristics of high ion density, fast etching rate, good directionality, and high etching selectivity. ICP can be used to etch deep grooves.Features:Etchable material: Si, SiO2, Si3N4Proces...