Reactive ion beam etching (RIE, RIE-150A, Tailong Electronics) is a dry etching method that combines the physical effects of ion bombardment generated by the glow discharge of a gas under a high-frequency electric field and the chemical reaction of active particles. It has good directivity, good uniformity over a large area, and can Etch fine pattern structure.Features:Etchable material: Si, Si...

High Resolution Scanning electron microscope(S9000 LMH，Tescan， equipped with Energy Dispersive Spectroscopy) is a type of electron microscope that produces images of a sample by scanning the surface with a focused beam of electrons. The electrons interact with atoms in the sample, producing various signals that contain information about the surface topography and composition of the sample. Th...

Nanoimprint Lithography (Eitre6，Obducat) is a simple nanolithography process of fabricating nanometer scale patterns with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Features:Imprin...

UV Lithography（H94-37，Sichuan Nanguang Vacuum Technology Co., Ltd.）is an important process used in microfabrication to pattern parts on a thin film or the bulk of a substrate. It is mainly used for small and medium-scale integrated device chips, films, optoelectronic device chips, and optical device substrates. This machine is suitable for alignment exposure of silicon, glass, ceramic, gem, ...