Atomic layer deposition system (f-100-41, MNT Micro and Nanotech Company)  is used to deposit monolayer ultrathin films. By accurately controlling the flow rate of the medium and using the cleaning medium, the device ensures that only one layer of monatomic layer super thin film can be deposited at a time.

Features:

Sample table size: 4 inches;

Substrate heating temperature: room temperature-120-200 ℃;

Temperature of precursor source pipeline: room temperature-160 ℃;

Precursor source: trimethyl aluminum, water;

Deposition accuracy: 1 angstrom.